Photosensitive diazo composition with graft copolymer for use in printing screen
US4154614A · kind A · utility
15Cited by
8References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 25, 1977 |
| Grant date | May 15, 1979 |
| Priority date | — |
| Expiry date | Aug 25, 1997 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The photosensitive composition contains a water-soluble graft copolymer of a partially hydrolyzed polyvinyl acetate grafted with acrylonitrile and optionally another vinylic monomer, a polymeric emulsion and a diazo compound. This composition possesses high resistance to solvent, abrasion and moisture and a favorable water-dissolubility as well.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.