Apparatus for treating substrates with an ion beam
US4155011A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 21, 1977 |
| Grant date | May 15, 1979 |
| Priority date | — |
| Expiry date | Dec 21, 1997 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68771
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for treating a substrate with an ion beam comprising a closed ousing which defines a substantially evacuatable chamber, a drum having a circumferential portion with an annular inside surface rotatably mounted in the chamber, drive means connected to the drum for rotating it at a selected speed to establish a centrifugal force toward the annular inside surface of the drum and ion beam generating means associated with the housing for directing an ion beam into the chamber and toward the annular inside surface. A substrate is supportable on the inside surface of the drum and conforms with the surface so as to be closely associated therewith under the influence of the centrifugal force. This association establishes a thermally conductive relationship between the substrate and the circumferential portion so that heat generated in the substrate due to the ion beam can be dissipated through the circumferential portion of the drum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.