Exposure station
US4157870A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 12, 1977 |
| Grant date | Jun 12, 1979 |
| Priority date | — |
| Expiry date | Aug 12, 1997 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/18
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A microfiche duplicator exposure station where a copy sheet lies facewise over a master while an elongated lamp shines light through the master to expose the copy sheet. A shutter that controls exposure, includes two plates lying over the lamp and a solenoid that quickly pivots the plates to positions beside opposite ends of the lamp to allow light from the lamp to reach the microfiche. The plates have mirror surfaces extending at an incline of about 60.degree. from the vertical when the plates are at opposite ends of the lamp, to shine light onto opposite ends of the microfiche, to thereby compensate for low illumination thereat produced by an elongated lamp.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.