Deposition method and products
US4162345A · kind A · utility
21Cited by
1References
23Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 7, 1977 |
| Grant date | Jul 24, 1979 |
| Priority date | — |
| Expiry date | Nov 7, 1997 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/256
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for producing a hard deposit on a substrate is described wherein a volatile halide of tungsten or molybdenum is reacted with a gas or gases containing hydrogen, oxygen and carbon to effect the deposition on a substrate of a compound of the metal in a liquid phase. The liquid phase deposited on the substrate is then reacted to remove oxygen and halogen and produce a hard deposit containing the metal and carbon. Also described are products which may be produced by the above method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.