X-ray analyzer for testing layered structures

US4169228A · kind A · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Marian Briska · Eppelheim, DE
• Armin Bohg · Altensteig, DE

Key dates

• Filing date: Jun 5, 1978
• Grant date: Sep 25, 1979
• Expiry date: Jun 5, 1998

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2223/076
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

X-ray fluorescence produced by a primary X-ray beam incident at a very flat angle (below 1.degree.) onto the surface of a specimen contained in a vacuum chamber is used to analyze shallow layers and/or to determine depths of shallow surface layers, such as a very thin (typically between about 10A and 10.sup.3 A) silicon coating on Al or Cu layers which overlay a silicon substrate. Semiconductor profile determination may be another application of the invention.