Thermally developable light-sensitive material
US4170480A · kind A · utility
18Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 7, 1977 |
| Grant date | Oct 9, 1979 |
| Priority date | — |
| Expiry date | Sep 7, 1997 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/49845
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A thermally developable light-sensitive material comprising a support having therein or in at least one layer thereon (a) an organic silver salt, (b) a photocatalyst, and (c) a reducing agent, and additionally (d) at least one 1,2,4-triazole compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.