Method of purifying metallurgical grade silicon employing reduced presure atmospheric control
US4172883A · kind A · utility
Inventors
Key dates
| Filing date | Jun 23, 1978 |
| Grant date | Oct 30, 1979 |
| Priority date | — |
| Expiry date | Jun 23, 1998 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/037
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method wherein a quartz tube is charged with chunks of metallurgical grade silicon and/or a mixture of such chunks and high purity quartz sand, and impurities from a class including aluminum, boron, and the like, as well as certain transition metals including nickel, iron, manganese and the like. The tube is then evacuated and heated to a temperature within a range of 800.degree. C. to 1400.degree. C., whereupon a stream of gas comprising a reactant, such as silicon tetrafluoride, continuously is delivered at low pressures through the charge for causing a metathetical reaction of impurities of the silicon and the reactant to occur for forming a volatile halide and leaving a residue of silicon of an improved purity. Additionally, the reactant may include carbon monoxide gas, whereby impurites such as iron and nickel react therewith to form volatile carbonyls.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.