Chemically treating the overcoat of a semiconductor device
US4173683A · kind A · utility
14Cited by
10References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 6, 1978 |
| Grant date | Nov 6, 1979 |
| Priority date | — |
| Expiry date | Apr 6, 1998 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing a semiconductor device having a passivating overcoat of insulating material disposed thereover comprises treating the overcoat with a silane solution prior to encapsulating the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.