Patent · US Expired

Exposure meter for photomicrography

US4174159A · kind A · utility

14Cited by

3References

15Claims

0Family size

Assignee

Ernst Leitz Wetzlar, GmbH · DE

Inventors

Winfried Kraft · Werdorf, DE
Gunter Reinheimer · Biebertal, DE
Herbert Leiter · Wetzlar, DE

Key dates

Filing date	Apr 11, 1978
Grant date	Nov 13, 1979
Priority date	—
Expiry date	Apr 11, 1998

Classification

Technology area (CPC G)Physics
CPC primaryG02B21/0096
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Photomicrographic exposure meter for cameras attached to microscopes in which part of the picture-taking beam is reflected by means of a beam-splitter and where the reflected beam part projects an image of the object onto an image plane, measuring field stop is located in the image plane with an aperture for detail or spot measurements and an insertable photo-electric detector cooperates therewith downstream of the stop in the direction of light. The beam part is reflected by at least one specular means (12,61) to the measuring field stop (13). The stop is gimbal-suspended and means are provided both for displacing the gimbal-suspended specular means (12,61) and for viewing the object detail appearing in the stop aperture.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.