Electrophotosensitive materials for migration imaging processes
US4175956A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 10, 1978 |
| Grant date | Nov 27, 1979 |
| Priority date | — |
| Expiry date | Feb 10, 1998 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09B57/007
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Electrophotosensitive materials having the structure ##STR1## is disclosed wherein R.sub.1 and R.sub.2, which may be the same or different, represent a monovalent or divalent substituted or unsubstituted 5 to 13 member heterocyclic nucleus or a substituted or unsubstituted 5 to 10 member saturated or unsaturated carbocyclic nucleus and said hetero atom is selected from the group consisting of O and N; PA1 R.sub.3 represents H, alkyl, aryl, or cyano and carboxyesters; PA1 m represents 0 or 1; PA1 n represents 0, 1, 2 or 3; and PA1 said substituted R.sub.1 and R.sub.2 substituents are selected from the group consisting of alkyl, hydroxy, phenyl, oxo, benzyl, carbamoyl, acetamido, nitro, piperidinyl, halo, and substituted amino.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.