Heat resistant photoresist composition and process for preparing the same
US4180404A · kind A · utility
12Cited by
6References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 16, 1978 |
| Grant date | Dec 25, 1979 |
| Priority date | — |
| Expiry date | Nov 16, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0387
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An organic polar solvent-soluble aromatic polyamide-imide having therein aromatic nuclei linked at their respective 1- and 3- positions and having therein amide linkages and terminal groups partially substituted with cinnamate groups is found to impart excellent heat resistance and insulating property to a photoresist composition produced therefrom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.