Cold plasma modification of organic and inorganic surfaces
US4188426A · kind A · utility
91Cited by
7References
3Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 12, 1977 |
| Grant date | Feb 12, 1980 |
| Priority date | — |
| Expiry date | Dec 12, 1997 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31544
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The surfaces of organic and inorganic substrates, such as polyethylene film and metals, respectively, can be modified by cold plasma deposition of difluorocarbene or trifluoromethyl radical specie generated by subjecting precursor vapor, for example, perfluorocyclobutane or hexafluoroethane, to a radio frequency electrical glow discharge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.