Vacuum coating apparatus
US4192253A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1978 |
| Grant date | Mar 11, 1980 |
| Priority date | — |
| Expiry date | Nov 21, 1998 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/458
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Vacuum apparatus for coating substrates by rotation including a vacuum chamber with an elongated material source having a longitudinal axis and a transverse axis, a substrate rack with a plurality of fastening points for the planar arrangement of a plurality of substrates above the material source in a substantially uniform distribution over its surface and a drive associated with the substrate rack for rotating substrates. The substrate rack has to parallel substrate bearers disposed fork-wise with couplings for the substrates positioned on the confronting inner sides of the substrate bearers. The substrate bearers are connected by angle drives to the substrate couplings and a motor via a drive shaft.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.