Metal vapor source with a regulatable flow and to an ion analyzer equipped with such a source
US4197455A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 6, 1978 |
| Grant date | Apr 8, 1980 |
| Priority date | — |
| Expiry date | Nov 6, 1998 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3002
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A metal vapor source with a regulatable flow rate comprising an enclosure filled with said vapor, means for heating said enclosure to a first temperature, a tube connected to the enclosure and means for heating said tube to a second regulatable temperature, the first temperature being maintained above the second temperature. An ion analyzer comprising an enclosure in which is disposed a target to be analyzed, a lens for extracting secondary ions whose front face faces the target, an enclosure filled with an alkaline vapor, means for heating said enclosure to a first regulatable temperature, a vapor outflow tube connected to one end of the enclosure, while the other end penetrates the analyzer enclosure, traverses the extraction lens and assumes a position level with the front face of the extraction lens and means for heating said tube to a second regulatable temperature, the first temperature being kept above the second temperature of the outflow tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.