Plasma spraying apparatus
US4199104A · kind A · utility
10Cited by
10References
1Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 21, 1977 |
| Grant date | Apr 22, 1980 |
| Priority date | — |
| Expiry date | Jan 21, 1997 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/42
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Plasma spraying apparatus is provided with means for selective release of carrier gas for the coating powder prior to the injection of the powder into the plasma stream. The gas release is effected by one or two apertured tube wall portions associated with a closure sleeve slidable on the tube or by a swirl chamber with a lateral gas outlet provided with a filter and a regulating valve.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.