Low resistance indium oxide coatings
US4201649A · kind A · utility
26Cited by
5References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 29, 1978 |
| Grant date | May 6, 1980 |
| Priority date | — |
| Expiry date | Nov 29, 1998 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/155
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method is disclosed for making low resistance thin indium oxide films by first depositing a thin primer layer of indium oxide at low temperature before heating to deposit the bulk of the conductive layer of indium oxide by cathode sputtering.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.