Multiprobe contact monitor and control system
US4201939A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 26, 1978 |
| Grant date | May 6, 1980 |
| Priority date | — |
| Expiry date | Jun 26, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/316
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A planarization and overtravel control circuit is disclosed utilized in conjunction with a multiprobe test system for testing microcircuits disposed on a semiconductor wafer surface. The planarization and overtravel control circuit enables the monitoring of the planarization limit required between data detector probe tips making contact with the integrated circuits on the semiconductor wafer. Overtravel, the distance the data detector probe tips travel into the semiconductor wafer, is also monitored by this apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.