Lithoplates of quaternary ammonium salt compositions
US4202699A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 7, 1978 |
| Grant date | May 13, 1980 |
| Priority date | — |
| Expiry date | Aug 7, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/004
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation sensitive composition comprises a quaternary ammonium salt and a chemical sensitizer of the formula ##STR1## wherein R.sup.21 is aryl, arylalkenyl or arylalkyl, R.sup.22 is aryl, alkyl, arylalkenyl, arylalkyl, carboxylic acid or salt, or hydrogen and X is carboxylic acid or salt. The quaternary ammonium salt is of the type which will accept at least one electron on exposure to radiation to form a substance capable of causing metal to be deposited onto said substance from an electroless plating solution in contact with said substance and comprising a salt of said metal and a reducing agent. A radiation sensitive plate comprises a metallic substrate coated with a radiation sensitive layer comprising a quaternary ammonium salt. The layer may be formed of the above composition. A lithographic printing plate is produced by image-wise exposing the plate, contacting the plate with an electroless plating solution and, if necessary, rendering the resultant image areas more oleophilic and the resultant non-image areas more hydrophilic.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.