Reactive ion etching process for metals
US4203800A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 2, 1979 |
| Grant date | May 20, 1980 |
| Priority date | — |
| Expiry date | Apr 2, 1999 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76892
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Metal layers, for example; chromium and titanium-tungsten, used in conductive metallurgies as adhesion or barrier layers for integrated circuit devices which are formed in silicon semiconductor substrates, are selectively etched without significant attack on either the silicon substrate or aluminum conductor layers. The metal layers are exposed to a glow discharge formed by imposing an RF voltage across two spaced electrodes in an ambient atmosphere comprising a gaseous mixture of from about 5 to about 20 percent by volume of a polychlorinated organic compound containing one to two carbon atoms, for example, CCl.sub.4 or C.sub.2 HCl.sub.3 and about 80 to about 95 percent by volume of oxygen at a pressure in the range of about 5 to 50 milli-torr.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.