Method for diffusing metals into substrates
US4206251A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 1, 1978 |
| Grant date | Jun 3, 1980 |
| Priority date | — |
| Expiry date | Jun 1, 1998 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B31/02
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The specification describes a process for diffusing a metal into a substrate which may be either a semiconductor material or a dielectric material. The substrate is first coated with a liquid composition comprising organo-metallic solutions of the desired metal and silica. The coated substrate is then heated at an elevated temperature for a period of time sufficient to cause the organic portion of the solution to decompose, thereby leaving a composite film comprising an oxide of the desired metal and SiO.sub.2. Upon further heating, the metal from the metal oxide diffuses into the substrate. The residual composite film may be left in place or removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.