Patent · US Expired

Arrangement and photometer for measuring and controlling the thickness of optically active thin layers

US4207835A · kind A · utility

7Cited by
2References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 16, 1977
Grant dateJun 17, 1980
Priority date
Expiry dateJun 16, 1997

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG05D5/03
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An arrangement and photometer for measuring and controlling the thickness of optically active thin layers wherein the axis of the measurement light beam coming from the measurement light source is directed to the measurement object and a referenced light receiver, independent of the optical properties of the measurement object, is associated with the measurement light beam. The output signal of the referenced light receiver is mixed with a trigger stage for a phase sensitive photometer amplifier and is fed to a compensation circuit for the equilization of brightness variations in the measurement light source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.