Photon absorbing surfaces and methods for producing the same
US4209008A · kind A · utility
33Cited by
9References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1977 |
| Grant date | Jun 24, 1980 |
| Priority date | — |
| Expiry date | Dec 23, 1997 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12993
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Photon absorbing surfaces which are effective over a broad band of photon energies are described. These surfaces consist of a two-phase material with a protruding second phase whose dimensions are on the order of microns. Photons are absorbed by multiple reflections within the region of the protruding phase. The surfaces are produced by directional solidification of eutectic compositions to produce aligned second phase microstructures within a metallic matrix. The matrix material is then selectively removed to expose the second phase material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.