Reactants delivery system for optical waveguide manufacturing
US4212663A · kind A · utility
51Cited by
4References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 26, 1978 |
| Grant date | Jul 15, 1980 |
| Priority date | — |
| Expiry date | Jan 26, 1998 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B2207/86
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus for forming a vapor of material to be hydrolyzed and/or oxidized and entraining the vapor in a carrier gas. The source material, in liquid form, is pumped to a point in the column above a porous packing. As the liquid progresses downward through the packing, it encounters a rising countercurrent of carrier gas. The source material vaporizes and is delivered to vapor deposition by the carrier gas. The source material vaporized in the apparatus may alternatively be delivered to an externally heated tubular reactor, or to any other kind of chemical vapor deposition (CVD) reactor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.