Heat developable photosensitive materials
US4212937A · kind A · utility
18Cited by
18References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 14, 1978 |
| Grant date | Jul 15, 1980 |
| Priority date | — |
| Expiry date | Dec 14, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/49845
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A heat developable photosensitive material comprising: PA1 (a) an organic silver salt oxidizing agent; PA1 (b) a halogen molecule or an organic haloamide compound; PA1 (c) a reducing agent for silver ion; and PA1 (d) a nitrogen-containing organic base whose pKa of the conjugate acid ranges from 0.5 to 10.0 and the nitrogen-containing organic base having, in its molecule, no acidic proton or a nitrogen-containing organic base whose pKa of its conjugate acid ranges from 0.5 to 10.0 and the nitrogen-containing organic base having, in its molecule, an acidic proton whose pKa is more than 12.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.