Gaseous trace impurity analyzer and method
US4214473A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 18, 1978 |
| Grant date | Jul 29, 1980 |
| Priority date | — |
| Expiry date | Dec 18, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N25/02
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Simple apparatus for analyzing trace impurities in a gas, such as helium or hydrogen, comprises means for drawing a measured volume of the gas as sample into a heated zone. A segregable portion of the zone is then chilled to condense trace impurities in the gas in the chilled portion. The gas sample is evacuated from the heated zone including the chilled portion. Finally, the chilled portion is warmed to vaporize the condensed impurities in the order of their boiling points. As the temperature of the chilled portion rises, pressure will develop in the evacuated, heated zone by the vaporization of an impurity. The temperature at which the pressure increase occurs identifies that impurity and the pressure increase attained until the vaporization of the next impurity causes a further pressure increase is a measure of the quantity of the preceding impurity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.