Process for the production of a sensitive plate for an exoelectron dosimeter
US4225785A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 20, 1979 |
| Grant date | Sep 30, 1980 |
| Priority date | — |
| Expiry date | Apr 20, 1999 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01T1/02
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
Process for the production of a sensitive plate for an exoelectron dosimeter by producing on a support a deposit of a mixture of two compositions constituted on the one hand by a substance having traps for the electrons and able to emit exoelectrons by thermal or optical stimulation and on the other by a substance having a good ionic conductivity, wherein it comprises making a homogeneous mixture of the powders constituting the two said compositions, producing by means of a plasma arc torch a plasma jet in the vicinity of the support on which the deposit is to be made and spraying said powder mixture into the jet to obtain a deposit which adheres to the support. The exoelectron dosimeter comprises a support to which adheres a plate constituted by two substances, one of which has traps for the electrons and is able to emit exoelectrons by thermal or optical stimulation and the other has a good ionic conductivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.