Gas distribution device for the supply of a processing gas with adjustable flow direction to an atomizing chamber
US4226603A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 3, 1979 |
| Grant date | Oct 7, 1980 |
| Priority date | — |
| Expiry date | Aug 3, 1999 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D53/18
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A processing gas is supplied to the atomizing zone around an atomizing device arranged centrally in an atomizing chamber through a conical guide duct communicating with a horizontal spiral duct through an annular mouth. A gas distribution incorporating a simple and accurate adjustment of the deflection of the gas stream from the spiral duct into the conical guide duct is obtained by means of two separate sets of stationary guide vanes arranged relatively close to and overlying each other in the mouth, one of said sets being constructed to deflect the gas stream stronger than the other set to a direction with a considerably smaller tangential velocity component, a damper being arranged along the mouth to be adjustable in the height direction for controlling the ratio of the portions of the gas stream in the spiral duct conducted into each of the two vane sets.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.