Electron beam microfabrication apparatus and method
US4227090A · kind A · utility
8Cited by
3References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 21, 1979 |
| Grant date | Oct 7, 1980 |
| Priority date | — |
| Expiry date | Feb 21, 1999 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31779
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Electron beam microfabrication apparatus has spherically concave photocathode pattern 40 which when excited produces patterned electron beam 48 which is accelerated by electrode 44 and magnetically focused by magnet 58 to impinge as a demagnified patterned field 60 on a photoresist carrying semiconductor wafer 36 mounted of wafer holder 34.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.