Wafer loading apparatus for beam treatment
US4228358A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 23, 1979 |
| Grant date | Oct 14, 1980 |
| Priority date | — |
| Expiry date | May 23, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Ion implantation equipment of the spinning disk type has an automated disk exchange system employing a pair of arms that interchange disks between a pair of exchange stations. One exchange station is defined by a back cover of a target chamber that hinges down. The disk drive motor is mounted on that cover and introduces water cooling for the disk through the drive shaft. Heat conductive elastomeric material interposed between the disk and its support on the shaft ensures good heat transfer from the disk in a high vacuum environment. The exchange system employs linear and rotary actuators of the fluid cylinder type, and the pickup head employs a pneumatic robot that operates a toggle clamp that secures the disk for its scanning rotation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.