Helical slow-wave structure assemblies and fabrication methods
US4229676A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 16, 1979 |
| Grant date | Oct 21, 1980 |
| Priority date | — |
| Expiry date | Mar 16, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49016
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Helical slow-wave structure assemblies including a helical dielectric supporting member are disclosed along with methods for fabricating such assemblies. After the slow-wave structure helix is wound on a mandrel, a masking helix is coaxially wound about the slow-wave structure helix in the same sense as the slow-wave structure helix over the helical space between turns of the slow-wave structure helix and in overlapping relationship with portions of adjacent turns of the slow-wave structure helix. The supporting helix is formed by plasma spraying dielectric material into the helical space between turns of the masking helix. The dielectric material is ground to a predetermined radial dimension, and the mandrel and the masking helix are removed. By utilizing a masking helix of tapered width, a dielectric supporting helix of tapered width may be fabricated to provide a slow-wave structure assembly with a tapered phase velocity. A slow-wave structure helix having a radially outwardly extending longitudinal ridge may be utilized to provide a structure of wide bandwidth.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.