Patent · US Expired

Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors

US4232106A · kind A · utility

74Cited by

2References

13Claims

0Family size

Assignee

FUJITSU LIMITED · JP

Inventors

Masayuki Iwasaki · Annaka City, JP
Shigeru Sato · Misawa, JP
Yasuo Inoue · Odawara, JP
Akira Nagashima · Tokyo, JP

Key dates

Filing date	Nov 16, 1978
Grant date	Nov 4, 1980
Priority date	—
Expiry date	Nov 16, 1998

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/121
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazole compounds represented by the following general formula (I): ##STR1## wherein W represents a substituted or unsubstituted aryl group, X represents a hydrogen atom, an alkyl group or an aryl group, Y represents a fluorine atom, a chlorine atom or a bromine atom, and n represents an integer of 1 to 3.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.