Metal vapor laser system
US4232274A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 1978 |
| Grant date | Nov 4, 1980 |
| Priority date | — |
| Expiry date | May 30, 1998 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/031
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A metal vapor laser discharge system includes a metal vapor laser and its associated circuit. The metal vapor laser discharge system is provided with a laser vessel which includes a discharge narrow tube filled with ionizable helium gas, the Brewster windows attached to both ends of the laser discharge narrow tube, and cathode and anode electrodes disposed in two branch tubes communicating with the discharge narrow tube. A metal reservoir is provided near the anode electrode and metal such as cadmium (Cd) is placed in the metal receiver. A helium supplemental container is coupled with the laser discharge narrow tube, through a helium passing wall. A high voltage circuit is connected between the anode and cathode electrodes. A heater provided around the metal reservoir is connected to a metal vapor supply circuit which controls current supplied to the heater to maintain the concentration of the ionizable metal vapor in the discharge narrow tube constant in the laser discharge narrow tube. The helium gas pressure in the discharge narrow tube is detected by a pressure detecting element. The output signal of the pressure detecting element is inputted to a helium gas supplemental circui…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.