Photosensitive film usable in microgravure
US4235958A · kind A · utility
16Cited by
1References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 11, 1979 |
| Grant date | Nov 25, 1980 |
| Priority date | — |
| Expiry date | May 11, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31504
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photosensitive film which can be used in microgravure, wherein it comprises at least one organic monomolecular layer having amphiphilic molecules with at least one irradiation polymerizable function and one aliphatic chain with at least 12 carbon atoms, a polymerizable function being located at the hydrophobic end of said molecules. The photosensitive films can be used with particular advantage in the production of microetched objects, such as optical and holographic systems, integrated optical devices and electronic microcircuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.