Scanning ion microscope
US4236073A · kind A · utility
Inventor
Key dates
| Filing date | May 27, 1977 |
| Grant date | Nov 25, 1980 |
| Priority date | — |
| Expiry date | May 27, 1997 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/256
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A scanning ion microscope is described in which the prior arts of scanning microscopy and achromatic quadrupole lens design as perfected for electrons are utilized for massive high-energy positive ions. Because the DeBroglie wavelength of the massive ions is smaller than the wavelength of electrons, diffraction in the objective lens is reduced. In principle resolution better than one Angstrom can be achieved. Because of the copious production of X-rays and Auger electrons in the specimen by such ions, specimens of atomic dimensions can be examined with a minimum of radiation damage by the ions. The specifically new, novel, and useful feature of this invention is the use of properly focused high-energy heavy-ion beams and the detection of single atomic events in the specimen, which together enable much greater sensitivity and resolution than attainable by other means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.