Patent · US Expired

Method and apparatus for vacuum depositing thin coatings using electron beams

US4238525A · kind A · utility

13Cited by

2References

8Claims

0Family size

Assignee

Leybold-Heraeus GmbH · DE

Inventors

Hans Aichert · Hanau, DE
Walter Dietrich · Yorktown Heights, US
Friedrich Stark · Langenselbold, DE
Herbert Stephan · Bruchköbel, DE

Key dates

Filing date	Nov 15, 1978
Grant date	Dec 9, 1980
Priority date	—
Expiry date	Nov 15, 1998

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/30
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Method and apparatus for vacuum depositing thin films on substrates which are located above 500.degree. C. by electron beam heating during the deposition. The substrates are positioned above an evaporating crucible filled with a bath of the material being evaporated which is also heated by electron beams. The electron beams are deflected at an angle of less than 80.degree. onto approximately one-half of the bath surface situated between the axis of symmetry and the end of the evaporating crucible.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.