Deposition method and products
US4239819A · kind A · utility
37Cited by
6References
29Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 11, 1978 |
| Grant date | Dec 16, 1980 |
| Priority date | — |
| Expiry date | Dec 11, 1998 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of depositing a hard, fine grained metal or semi-metal alloy is described wherein a volatile halide of the metal or semi-metal is partially reduced and then deposited as a liquid phase intermediate compound onto a substrate in the presence of an alloying gas. The liquid phase deposited on the substrate is then thermochemically reacted to produce the hard, fine grained alloy. Also described are products which may be produced by the above method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.