Polymers for aqueous processed photoresists
US4239849A · kind A · utility
26Cited by
3References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 19, 1978 |
| Grant date | Dec 16, 1980 |
| Priority date | — |
| Expiry date | Jun 19, 1998 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A new photopolymerizable composition which contains an addition polymerizable monomer, a photoinitiator, and an improved binding agent which is a polymer of three types of monomeric materials, namely, a styrene-type monomer, an acrylate monomer, and an alpha, beta-unsaturated carboxyl-containing monomer. These compositions are useful for flexible photopolymerizable films which, after exposure, may be developed in aqueous alkaline solutions. These films may be used as photo-resists, screen stencils and printing plates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.