Patent · US Expired

Device for producing polycrystalline silicon

US4242307A · kind A · utility

18Cited by
8References
9Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 13, 1979
Grant dateDec 30, 1980
Priority date
Expiry dateJun 13, 1999

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/1092
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The invention relates to a method and device for producing polycrystalline silicon. The method consists in particular in purifying a bath of molten silicon which contains impurities by bubbling a mixture of chlorine and oxygen and in progressively crystallizing the purified silicon in a receptacle (22) which is moved vertically downwards in a vertical gradient of temperatures which increase towards the top. Application to manufacturing solar photocells.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.