Plasma development process controller
US4246060A · kind A · utility
10Cited by
0References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 2, 1979 |
| Grant date | Jan 20, 1981 |
| Priority date | — |
| Expiry date | Jan 2, 1999 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/76
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
End point detection in developing photoresist is accomplished by monitoring the output of a photodetector and sensing a plateau in the output.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.