Photosensitive material for use in electrophotography
US4250240A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 19, 1979 |
| Grant date | Feb 10, 1981 |
| Priority date | — |
| Expiry date | Jun 19, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a photosensitive material for use in electrophotography comprising a photoconductive layer on which there is a transparent protective layer consisting essentially of a substance resulting from partial hydrolysis of a mixture of (a) a compound having the following general formula I, (b) a copolymer of a compound having the general formula II with a compound having the general formula III or maleic anhydride and (c) a compound having the general formula IV, PA1 (1) General formula I EQU (R.sup.1).sub.l Si(OR.sup.2).sub.m PA1 [wherein R.sup.1 is a C.sub.1-4 alkyl radical, vinyl radical, .gamma.-methacryloxypropyl radical, phenyl radical, .gamma.-glycidoxypropyl radical, .gamma.-chloropropyl radical, .gamma.-mercaptopropyl radical, .gamma.-.beta.(aminoethyl).gamma.-aminopropyl radical or .gamma.-aminopropyl radical; R.sup.2 is a hydroxyethylalkyl ether radical or C.sub.1-4 alkyl radical; l is 0-2; and m is 2-4.] PA1 (2) General formula II ##STR1## [wherein R.sup.3 is hydrogen or a methyl radical; R.sup.4 is hydrogen or a C.sub.1-4 alkyl radical; n is 1-4; and q is 1-3.] PA1 (3) General formula III ##STR2## [wherein R.sup.5 is hydrogen or a methyl radica…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.