Electrostatic emission lens
US4255661A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 24, 1979 |
| Grant date | Mar 10, 1981 |
| Priority date | — |
| Expiry date | Jul 24, 1999 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/12
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrostatic emission lens arrangement for producing a microparticle ge of a surface by means of charged particles emitted from such surface and accelerated to a predetermined final energy level. Such arrangement includes two apertured diaphragms arranged in spaced relationship to each other and to the emitting surface, and a voltage biasing source for producing a potential difference between the surface and the adjacent first apertured diaphragm electrode, and a potential difference between the first apertured diaphragm electrode and the second apertured diaphragm electrode. According to the invention the spacing distance between the emitting surface and first apertured diaphragm electrode and the spacing distance between the two apertured diaphragm electrodes and, the relationship between the potentials of the surface and of the electrodes are so dimensioned that the charged particles are accelerated between the emitting surface and the first apertured diaphragm electrodes to a multiple of the desired final energy level, and that the particles are retarded to the desired final energy level in passing between the two apertured diaphragm electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.