High energy XeBr electric discharge laser
US4259645A · kind A · utility
2Cited by
1References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 1979 |
| Grant date | Mar 31, 1981 |
| Priority date | — |
| Expiry date | Apr 10, 1999 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high energy XeBr laser for producing coherent radiation at 282 nm. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr is used as the halogen donor which undergoes harpooning reactions with Xe.sub.M * to form XeBr*.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.