Plasma development process controller
US4263089A · kind A · utility
18Cited by
2References
2Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 10, 1980 |
| Grant date | Apr 21, 1981 |
| Priority date | — |
| Expiry date | Mar 10, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/76
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
End point detection in developing photoresist is accomplished by monitoring the output of a photodetector and sensing a plateau in the output.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.