Light-sensitive photographic materials with improved antistatic layers
US4264707A · kind A · utility
16Cited by
14References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 13, 1978 |
| Grant date | Apr 28, 1981 |
| Priority date | — |
| Expiry date | Oct 13, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/95
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photographic material comprising a light sensitive photographic layer and a support having thereon in order a layer containing alumina sol including colloidal particles and an electrolyte and a layer containing a hydrophobic polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.