Radiation sensitive element having a thin photopolymerizable layer
US4264708A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 1980 |
| Grant date | Apr 28, 1981 |
| Priority date | — |
| Expiry date | Mar 26, 2000 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photopolymerizable element, preferably a lithographic plate, is provided. This element comprises a substrate bearing a photopolymerizable layer having a weight of about 1 to about 90 mg/dm.sup.2, said layer comprising: PA0 (1) at least one ethylenically unsaturated diester polyhydroxy polyether of the formula ##STR1## wherein R is H or CH.sub.3 ; R.sup.4 is H or an alkyl of 1-4 carbon atoms; n is 1-15; p is 0 or 1; and, when p is 1, R.sup.5 is H or CH.sub.3, and R.sup.6 is H, CH.sub.3 or C.sub.2 H.sub.5 ; PA0 (2) an organic, radiation-sensitive, free-radical generating system comprising 2,4,5-triarylimidazolyl dimer and p-aminophenyl ketone; and PA0 (3) a macromolecular, organic, polymeric binder. A polymeric image is formed by imagewise exposing the layer to actinic radiation and then developing the resulting image such as by removing unexposed portions of the layer with a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.