Antistatic layer for silver halide photographic materials
US4266016A · kind A · utility
18Cited by
6References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1979 |
| Grant date | May 5, 1981 |
| Priority date | — |
| Expiry date | Aug 27, 1999 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/85
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Silver halide photographic materials having excellent antistatic property and high acceptability for drafting, processing resistance and adhesion to hydrophobic supports can be obtained by providing antistatic layer which comprises (a) a styrene-maleic anhydride copolymer, (b) colloidal silica and (c) at least one compound selected from the group consisting of compounds having at least 2 ethyleneimino groups and compounds having at least 2 epoxy rings and which has a pH value of at least about 5, said antistatic layer being provided on one or both surfaces of the support.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.