Low reflectivity surface formed by particle track etching
US4268347A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 26, 1979 |
| Grant date | May 19, 1981 |
| Priority date | — |
| Expiry date | Jan 26, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
Abstract
Low reflectivity surfaces are formed by particle track etching of a dielectric material such that the horizontal scale of surface texture is less than the wavelength of incident radiation and the depth of texture is equal to or greater than said wavelength. As a consequence, the reflection coefficient is thereby reduced by a factor of at least two, and light is more efficiently transmitted into the material. For solar cells encapsulated in transparent material, efficiency of absorption of solar radiation may be improved by at least about two times per etched surface, or to less than about 2% for the air/transparent material interface and to less than about 15% for the transparent material/solar cell interface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.