Photomasking composition, process for preparing same and mask obtained
US4268590A · kind A · utility
5Cited by
7References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 6, 1980 |
| Grant date | May 19, 1981 |
| Priority date | — |
| Expiry date | Mar 6, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to resins used for manufacturing or reproducing masks in electronics. The photomasking composition corresponds to the general formula: ##STR1## in which R.sub.1, R.sub.1 ', R.sub.1 ", R.sub.2, R.sub.2 ', R.sub.2 " designate alkyl radicals whose principal chain contains from 1 to 10 carbon atoms, the symbols F, Cl and Br which designate the fluorine, chlorine and the bromine bearing indices a, b, c, a', b', and c' representing the number of these atoms which are zero or positive whole numbers, such as m, n, p.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.