Device for the projection printing of the masks of a mask set onto a semiconductor substrate

US4269505A · kind A · utility

Assignee

• Censor Patent- und Versuchs-Anstalt · LI

Inventor

• Herbert E. Mayer · Abensberg, DE

Key dates

• Filing date: Oct 10, 1979
• Grant date: May 26, 1981
• Expiry date: Oct 10, 1999

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F9/70
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A device for the projection printing of the masks of a mask set onto a semiconductor substrate comprising a projection lens for imaging the patterns of said masks on photosensitive layers of said substrate. Alignment patterns are disposed said masks and alignment targets on said substrate. Said alignment patterns of at least one of said masks and said alignment targets of said substrate are positioned in non-conjugated areas in respect of the projection lens, i.e. in areas which cannot be imaged into one another by means of said projection lens. For the alignment process between said mask and said substrate auxiliary optical means are provided, said alignment targets of said substrate and said alignment patterns of said mask being imaged into one another by means of said auxiliary optical means.