Silicon nitride and silicon oxide etchant
US4269654A · kind A · utility
43Cited by
6References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 1979 |
| Grant date | May 26, 1981 |
| Priority date | — |
| Expiry date | May 9, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/978
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An etching solution for etching composite structures of silicon nitride on silicon oxide on silicon substrates which etches the silicon nitride at a rate equal to or faster than the silicon oxide which comprises concentrated aqueous hydrogen fluoride in a high boiling, organic solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.